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Developing a RF Ion Source for 4MV Electrostatic Accelerator(PDF)

南京师范大学学报（工程技术版）[ISSN:1006-6977/CN:61-1281/TN]

Issue:
2005年03期
Page:
8-11
Research Field:
Publishing date:

Info

Title:
Developing a RF Ion Source for 4MV Electrostatic Accelerator
Author(s):
SUN Zhenwu1;  LI Tao1;  ZHENG Shiquan1;  LI Yuxiao1;  JIANG Shengnan1 WANG Jianyong2;  HUO Yuping1
1.School of Physics Engineering, Zhengzhou University, Henan Zhengzhou 450052, China; 2.Institute of Heavy Ion Physics, Peking University, Beijing 100871, China
Keywords:
electrostatic acce le rato r;  ion source;  ion beam;  osc illa to r
PACS:
TL52
DOI:
-
Abstract:
A RF ion source fo r 4MV e lectrostatic acce le ra to r is designed and debugged. The influence o f various factors on the RF ion source d ischarg ing is stud ied. It is found that keeping the inne r wa ll of discharge bottle clean, loading ho rizon talm agnet firstly, shortening the length o f copper rope and e lectrop la ting itw ith silver can ev idently reduce the low est d ischarge vo ltage. Re lationships between ion beam intensity and som e param eters includ ing plate vol-t age o f the osc illa tor, gas pressure and extraction vo ltage are de term ined. It is found that ion beam intensity increases along w ith discha rge voltage increas ing, has a culm ination w ith gas pressure chang ing and presents the property o f d-i ode w ith ex traction vo ltage chang ing. The exper im ent on e lectrosta tic acceleratorm akes known tha t the w ay o f load ing and un load ing ex traction vo ltage in fluences on ion source d ischarg ing. The reasons o f the phenom ena above a re analyzed. By comprehensive debugg ing, an stab le ion beam w ith 178μ A is obta ined under the condition of the plate vol-t age o f 580 V, the g as pressure o f 8× 10- 4 Pa, the extraction vo ltag e of 1. 65 kV and the fo cusing voltage o f 21 kV.

References:

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Memo

Memo:
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Last Update: 2013-04-29