[1]孙振武,李 涛,郑世全,等.4MV静电加速器用高频离子源的研制[J].南京师范大学学报(工程技术版),2005,05(03):008-11.
 SUN Zhenwu,LI Tao,ZHENG Shiquan,et al.Developing a RF Ion Source for 4MV Electrostatic Accelerator[J].Journal of Nanjing Normal University(Engineering and Technology),2005,05(03):008-11.
点击复制

4MV静电加速器用高频离子源的研制
分享到:

南京师范大学学报(工程技术版)[ISSN:1006-6977/CN:61-1281/TN]

卷:
05卷
期数:
2005年03期
页码:
008-11
栏目:
出版日期:
2005-09-30

文章信息/Info

Title:
Developing a RF Ion Source for 4MV Electrostatic Accelerator
作者:
孙振武1 李 涛1 郑世全1 李玉晓1 姜胜男1 王建勇2 霍裕平1
1. 郑州大学物理工程学院, 河南郑州450052;
2. 北京大学重离子研究所, 北京100871
Author(s):
SUN Zhenwu1 LI Tao1 ZHENG Shiquan1 LI Yuxiao1 JIANG Shengnan1 WANG Jianyong2 HUO Yuping1
1.School of Physics Engineering, Zhengzhou University, Henan Zhengzhou 450052, China; 2.Institute of Heavy Ion Physics, Peking University, Beijing 100871, China
关键词:
静电加速器 离子源 离子束 振荡器
Keywords:
electrostatic acce le rato r ion source ion beam osc illa to r
分类号:
TL52
摘要:
设计和调试了一台4MV静电加速器用高频离子源;研究了诸因素对离子源起弧的影响,发现保持放电管内壁的清洁、先加载横向磁场、缩短铜辫的长度并进行镀银处理可明显降低最低起弧板压;测试了束流强度与振荡器板压、离子源气压和引出电压的关系,发现流强随板压的升高而升高,随气压的变化有一极大值,而随引出电压的变化呈二极管的伏安特性;上机试验表明引出电压的加卸载方式对离子源的起弧状况也将产生明显影响;分析了上述各现象出现的原因;经综合调试,在580V板压、8×10-4 Pa气压、1.65kV引出电压和21kV聚焦电压的状态下,得到了束流为178μA的稳定离子束.
Abstract:
A RF ion source fo r 4MV e lectrostatic acce le ra to r is designed and debugged. The influence o f various factors on the RF ion source d ischarg ing is stud ied. It is found that keeping the inne r wa ll of discharge bottle clean, loading ho rizon talm agnet firstly, shortening the length o f copper rope and e lectrop la ting itw ith silver can ev idently reduce the low est d ischarge vo ltage. Re lationships between ion beam intensity and som e param eters includ ing plate vol-t age o f the osc illa tor, gas pressure and extraction vo ltage are de term ined. It is found that ion beam intensity increases along w ith discha rge voltage increas ing, has a culm ination w ith gas pressure chang ing and presents the property o f d-i ode w ith ex traction vo ltage chang ing. The exper im ent on e lectrosta tic acceleratorm akes known tha t the w ay o f load ing and un load ing ex traction vo ltage in fluences on ion source d ischarg ing. The reasons o f the phenom ena above a re analyzed. By comprehensive debugg ing, an stab le ion beam w ith 178μ A is obta ined under the condition of the plate vol-t age o f 580 V, the g as pressure o f 8× 10- 4 Pa, the extraction vo ltag e of 1. 65 kV and the fo cusing voltage o f 21 kV.

参考文献/References:

[ 1] 徐建铭. 加速器原理[M ]. 北京: 科学出版社, 1974. 14- 62.
[ 2] 叶铭汉, 陈监璞. 静电加速器[M ]. 北京: 科学出版社, 1965. 233 -237.
[ 3] Lee Y, Gough R A, Kunke lW B, et al. Ion ene rgy spread and cu rrent m easu rem ents o f the r-f driven m ulticusp ion source[ J]. Rev Sc i Instr, 1997, 68( 3): 1398- 1402.
[ 4] 张华顺, 万春侯, 王耿介. 等离子源和大功率中性束源 [M ]. 北京: 原子能出版社, 1987. 77- 98.
[ 5] Yoshida Y, Take iri Y. The use o f m agnetic fields in a partia-l coax ia l m icrow ave cav ity ho ley-plate ion source [ J]. Rev Sc i Instr, 2000, 71( 1): 66- 69.
[ 6] 葛波维奇, 万春侯. 离子体离子源物理与技术[M ]. 北京: 科学出版社, 1976. 140- 150.

备注/Memo

备注/Memo:
作者简介: 孙振武( 1967-) , 副教授, 主要从事核物理方面的研究. E-m ail: sunzw@ zzu. edu. cn
更新日期/Last Update: 2013-04-29